Nonlinear increase in silicon epitaxial growth rate in a...

Nonlinear increase in silicon epitaxial growth rate in a SiHCl3H2 system under atmospheric pressure

Hitoshi Habuka, Masatake Katayama, Manabu Shimada, Kikuo Okuyama
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Volume:
182
Year:
1997
Language:
english
Pages:
11
DOI:
10.1016/s0022-0248(97)00354-0
File:
PDF, 787 KB
english, 1997
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