Nonlinear increase in silicon epitaxial growth rate in a SiHCl3H2 system under atmospheric pressure
Hitoshi Habuka, Masatake Katayama, Manabu Shimada, Kikuo OkuyamaVolume:
182
Year:
1997
Language:
english
Pages:
11
DOI:
10.1016/s0022-0248(97)00354-0
File:
PDF, 787 KB
english, 1997