Optimization of AlGaN films grown by RF atomic nitrogen plasma using in-situ cathodoluminescence
J.M. Van Hove, P.P. Chow, A.M. Wowchak, J.J. Klaassen, M.F. Rosamond, D.R. CroswellVolume:
175-176
Year:
1997
Language:
english
Pages:
5
DOI:
10.1016/s0022-0248(97)00869-5
File:
PDF, 426 KB
english, 1997