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Oxygen distribution in silicon melt during a standard Czochralski process studied by sensor measurements and comparison to numerical simulation
A. Mühe, R. Backofen, J. Fainberg, G. Müller, E. Dornberger, E. Tomzig, W. von AmmonVolume:
198-199
Year:
1999
Language:
english
Pages:
5
DOI:
10.1016/s0022-0248(98)01080-x
File:
PDF, 520 KB
english, 1999