Low pressure chemical vapor deposition of silicon nitride...

Low pressure chemical vapor deposition of silicon nitride using the environmentally friendly tris(dimethylamino)silane precursor

Levy, R. A., Lin, X., Grow, J. M., Boeglin, H. J., Shalvoy, R.
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Volume:
11
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/jmr.1996.0184
Date:
June, 1996
File:
PDF, 246 KB
english, 1996
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