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Development of preferred orientation in polycrystalline AlN thin films deposited by rf sputtering system at low temperature
Rodríguez-Navarro, A., Otaño-Rivera, W., García-Ruiz, J. M., Messier, R., Pilione, L. J.Volume:
12
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/jmr.1997.0254
Date:
July, 1997
File:
PDF, 322 KB
english, 1997