Void nucleation in metal interconnects: Combined effects of...

Void nucleation in metal interconnects: Combined effects of interface flaws and crystallographic slip

Shen, Y-L.
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Volume:
14
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/jmr.1999.0083
Date:
February, 1999
File:
PDF, 526 KB
english, 1999
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