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Influence of the electrokinetic behaviors of abrasive ceria particles and the deposited plasma-enhanced tetraethylorthosilicate and chemically vapor deposited Si3N4 films in an aqueous medium on chemical mechanical planarization for shallow trench isolation
Kim, Sang-Kyun, Lee, Sangkyu, Paik, Ungyu, Katoh, Takeo, Park, Jea-GunVolume:
18
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/jmr.2003.0302
Date:
September, 2003
File:
PDF, 166 KB
english, 2003