Effect of as-deposited residual stress on transition temperatures of VO2 thin films
Tsai, Kuang Yue, Chin, Tsung-Shune, Shieh, Han-Ping D., Ma, Cheng HsinVolume:
19
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/jmr.2004.0299
Date:
August, 2004
File:
PDF, 2.26 MB
english, 2004