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Effect of deposition temperature on the characteristics of hafnium oxide films deposited by metalorganic chemical vapor deposition using amide precursor
Takahashi, Kenji, Funakubo, Hiroshi, Hino, Shiro, Nakayama, Makoto, Ohashi, Naoki, Kiguchi, Takanori, Tokumitsu, EisukeVolume:
19
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/jmr.2004.19.2.584
Date:
February, 2004
File:
PDF, 211 KB
english, 2004