Tailored Deposition by LPCVD of Non-stoichiometric Si Oxides and their Application in the Formation of Si Nanocrystals Embedded in SiO2 by Thermal Annealing
Morana, Bruno, de Sande, Juan Carlos G., Rodríguez, Andrés, Sangrador, Jesús, Rodríguez, Tomás, Avella, Manuel, Prieto, Ángel Carmelo, Jiménez, JuanVolume:
989
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-0989-a23-01
Date:
January, 2007
File:
PDF, 165 KB
english, 2007