The Effect of Electrical Stress on the New Top Gate N-type...

MRS Proceedings 2008 / 1 Vol. 1066

The Effect of Electrical Stress on the New Top Gate N-type Depletion Mode Polycrystalline Thin Film Transistors Fabricated by Alternating Magnetic Field Enhanced Rapid Thermal Annealing

Lee, Won-Kyu, Han, Sang-Myeon, Park, Sang-Geun, Choi, Sung-Hwan, Choi, Joonhoo, Han, Min-Koo
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Volume:
1066
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-1066-a16-02
Date:
January, 2008
File:
PDF, 215 KB
english, 2008
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