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Oxide Reduction in Advanced Metal Stacks for Microelectronic Applications
Qin, Wentao, Volinsky, Alex A., Werho, Dennis, David Theodore, N.Volume:
786
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-786-e6.33
Date:
January, 2003
File:
PDF, 835 KB
english, 2003