Mechanism of Surfactant Removal from Ordered Nanocomposite...

MRS Proceedings 2003 / 1 Vol. 788

Mechanism of Surfactant Removal from Ordered Nanocomposite Silica Thin Films by Deep-UV Light Exposure

Dattelbaum, Andrew M., Amweg, Meri L., Ruiz, Julia D., Ecke, Laurel E., Shreve, Andrew P., Parikh, Atul N.
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Volume:
788
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-788-l7.11
Date:
January, 2003
File:
PDF, 137 KB
english, 2003
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