Photopatterning Based on a Chemically Amplified Mechanism...

Photopatterning Based on a Chemically Amplified Mechanism Nano-Sheet Films

Li, Tie Sheng, He, Xiao Hang, Zou, Ke Ke, Xu, Wen Jian, Wu, Ynag Jie, Miyashita, Tokuji
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Volume:
260-261
Language:
english
Journal:
Applied Mechanics and Materials
DOI:
10.4028/www.scientific.net/amm.260-261.707
Date:
December, 2012
File:
PDF, 385 KB
english, 2012
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