Effect of Pad Surface Asperity on Removal Rate in Chemical Mechanical Polishing
Uneda, Michio, Maeda, Yuki, Ishikawa, Ken Ichi, Shibuya, Kazutaka, Nakamura, Yoshio, Ichikawa, Koichiro, Doi, Toshiro K.Volume:
497
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/amr.497.256
Date:
April, 2012
File:
PDF, 823 KB
english, 2012