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Preliminary Results of Numerical Profiles for the Simultaneous Diffusion of Boron and Point Defects in Silicon using Irreversible Thermodynamic Theory
An, Dao Khac, Dung, Vu BaVolume:
194-199
Year:
2001
Journal:
Defect and Diffusion Forum
DOI:
10.4028/www.scientific.net/ddf.194-199.647
File:
PDF, 426 KB
2001