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Investigation of Chemical Mechanical Polishing of GaAs Wafer by the Effect of a Photocatalyst
Hong, S.H., Isii, H., Touge, Mutsumi, Watanabe, JunjiVolume:
291-292
Year:
2005
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/kem.291-292.381
File:
PDF, 516 KB
english, 2005