Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide
Sano, Yasuhisa, Watanabe, Masayo, Kato, Takehiro, Yamamura, Kazuya, Mimura, Hidekazu, Yamauchi, KazutoVolume:
600-603
Year:
2009
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/msf.600-603.847
File:
PDF, 566 KB
english, 2009