Composition and Interface Chemistry Dependence in Ohmic...

Composition and Interface Chemistry Dependence in Ohmic Contacts to GaN HEMT Structures on the Ti/Al Ratio and Annealing Conditions

Kolaklieva, Lilyana, Kakanakov, Roumen, Stefanov, P., Cimalla, Volker, Maroldt, S., Ambacher, Oliver, Tonisch, Katja, Niebelschütz, Florentina
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Volume:
615-617
Year:
2009
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/msf.615-617.951
File:
PDF, 920 KB
english, 2009
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