Composition and Interface Chemistry Dependence in Ohmic Contacts to GaN HEMT Structures on the Ti/Al Ratio and Annealing Conditions
Kolaklieva, Lilyana, Kakanakov, Roumen, Stefanov, P., Cimalla, Volker, Maroldt, S., Ambacher, Oliver, Tonisch, Katja, Niebelschütz, FlorentinaVolume:
615-617
Year:
2009
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/msf.615-617.951
File:
PDF, 920 KB
english, 2009