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Influence of the N/Al Ratio in the Gas Phase on the Growth of AlN by High Temperature Chemical Vapor Deposition (HTCVD)
Claudel, Arnaud, Blanquet, Elisabeth, Chaussende, Didier, Pique, D., Pons, MichelVolume:
615-617
Year:
2009
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/msf.615-617.987
File:
PDF, 6.49 MB
english, 2009