![](/img/cover-not-exists.png)
Use of SiCl4 as Silicon Precursor for Low-Temperature Halo-Carbon Epitaxial Growth of 4H-SiC
Kotamraju, Siva Prasad, Krishnan, Bharat, Melnychuk, Galyna, Koshka, YaroslavVolume:
645-648
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/msf.645-648.111
Date:
April, 2010
File:
PDF, 402 KB
english, 2010