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Off-Orientation Influence on C-Face (0001) 4H-SiC Surface Morphology Produced by Etching Using Chlorine Trifluoride Gas
Fukumoto, Yusuke, Habuka, Hitoshi, Kato, TokohisaVolume:
778-780
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/msf.778-780.734
Date:
February, 2014
File:
PDF, 683 KB
english, 2014