Chemical Reaction Dynamics of SiO 2...

Japanese Journal of Applied Physics 2013 / 02 Vol. 52; Iss. 2R

Chemical Reaction Dynamics of SiO 2 Etching by CF 2 Radicals: Tight-Binding Quantum Chemical Molecular Dynamics Simulations

Ito, Hiroshi, Kuwahara, Takuya, Higuchi, Yuji, Ozawa, Nobuki, Samukawa, Seiji, Kubo, Momoji
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Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/jjap.52.026502
Date:
February, 2013
File:
PDF, 1.61 MB
english, 2013
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