Characterization of Ge Films on Si(001) Substrates Grown by Nanocontact Epitaxy
Ikeda, Wataru, Nakamura, Yoshiaki, Okamoto, Shogo, Takeuchi, Shotaro, Kikkawa, Jun, Ichikawa, Masakazu, Sakai, AkiraVolume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/jjap.52.095503
Date:
September, 2013
File:
PDF, 439 KB
english, 2013