Nanoimprint Lithography of 20-nm-Pitch Dot Array Pattern...

Japanese Journal of Applied Physics 2013 / 10 Vol. 52; Iss. 10R

Nanoimprint Lithography of 20-nm-Pitch Dot Array Pattern Using Tone Reversal Process

Ootera, Yasuaki, Sugawara, Katsuya, Kanamaru, Masahiro, Yamamoto, Ryousuke, Kawamonzen, Yoshiaki, Kihara, Naoko, Kamata, Yoshiyuki, Kikitsu, Akira
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Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/jjap.52.105201
Date:
October, 2013
File:
PDF, 90 KB
english, 2013
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