Simulation of Fine Resist Profile Formation by Electron...

Japanese Journal of Applied Physics 2013 / 12 Vol. 52; Iss. 12R

Simulation of Fine Resist Profile Formation by Electron Beam Drawing and Development with Solubility Rate Based on Energy Deposition Distribution

Zhang, Hui, Komori, Takuya, Zhang, Yulong, Yin, You, Hosaka, Sumio
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Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/jjap.52.126504
Date:
December, 2013
File:
PDF, 63 KB
english, 2013
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