Fabrication of suspended amorphous indium–gallium–zinc...

Japanese Journal of Applied Physics 2014 / 06 Vol. 53; Iss. 6

Fabrication of suspended amorphous indium–gallium–zinc oxide thin-film transistors using bulk micromachining techniques

Iwamatsu, Shinnosuke, Takechi, Kazushige, Yahagi, Toru, Abe, Yutaka, Tanabe, Hiroshi, Kobayashi, Seiya
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Volume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/jjap.53.066503
Date:
June, 2014
File:
PDF, 311 KB
english, 2014
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