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Height reversal of Si micro dot and well patterns during Si nanowire formation by Ag-assisted chemical etching
Yamaura, Daichi, Takeuchi, Koji, Lu, Zhiqiang, Arai, Yuki, Ogino, ToshioVolume:
54
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/jjap.54.055203
Date:
May, 2015
File:
PDF, 492 KB
english, 2015