Height reversal of Si micro dot and well patterns during Si...

Height reversal of Si micro dot and well patterns during Si nanowire formation by Ag-assisted chemical etching

Yamaura, Daichi, Takeuchi, Koji, Lu, Zhiqiang, Arai, Yuki, Ogino, Toshio
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
54
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/jjap.54.055203
Date:
May, 2015
File:
PDF, 492 KB
english, 2015
Conversion to is in progress
Conversion to is failed