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Monitoring of inner wall condition in mass-production plasma etching process using a load impedance monitoring system
Kasashima, Yuji, Kurita, Hiroyuki, Kimura, Naoya, Ando, Akira, Uesugi, FumihikoVolume:
54
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/jjap.54.060301
Date:
June, 2015
File:
PDF, 249 KB
english, 2015