Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs...

Journal of The Electrochemical Society 2011 Vol. 158; Iss. 6

Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time

Byun, Young-Chul, An, Chee-Hong, Choi, Ju Yun, Kim, Chung Yi, Cho, Mann-Ho, Kim, Hyoungsub
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Volume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3569751
File:
PDF, 1.80 MB
english, 2011
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