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Reduction of Particle Contamination in Plasma-Etching Equipment by Dehydration of Chamber Wall
Ito, Natsuko, Moriya, Tsuyoshi, Uesugi, Fumihiko, Matsumoto, Masao, Liu, Shenjian, Kitayama, YoshihikoVolume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.47.3630
Date:
May, 2008
File:
PDF, 203 KB
english, 2008