![](/img/cover-not-exists.png)
Uniform tungsten silicide films produced by chemical vapor depostiton
G Telford Susan, Ch Tseng Meng, Michio ArugaVolume:
87
Year:
1998
Language:
english
DOI:
10.1016/s0022-1139(97)80372-7
File:
PDF, 98 KB
english, 1998