Development of plasma-based implant for silicon devices

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2006 Vol. 24; Iss. 1

Development of plasma-based implant for silicon devices

Walther, Steve, Liebert, Reuel
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Volume:
24
Year:
2006
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.2101598
File:
PDF, 973 KB
english, 2006
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