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ECS Transactions [ECS 218th ECS Meeting - Las Vegas, NV (October 10 - October 15, 2010)] - Effect of CMP Pad and Slurry to STI and ILD Polishing
Huang, David, Babu, S.V., Wang, Liangyong, Moser, TimYear:
2010
Language:
english
DOI:
10.1149/1.3489042
File:
PDF, 224 KB
english, 2010