Fabrication of porous ZnO thin films using wet chemical etching with 0.5% HNO 3
Chai Im, Ang, Lu Tze Jian, Leonard, Poh Kok, Ooi, Yaakob, Suriani, Chin Guan, Ching, Sha Shiong, Ng, Hassan, Zainuriah, Abu Hassan, Haslan, Johar Abdullah, MatVolume:
29
Language:
english
Journal:
Microelectronics International
DOI:
10.1108/13565361211237699
Date:
May, 2012
File:
PDF, 216 KB
english, 2012