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X-ray diffraction from low temperature ion implanted silicon
Noboru Tsukuda, Eiichi Kuramoto, Masato Noda, Hidetaka NakazonoVolume:
239
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/s0022-3115(96)00471-0
File:
PDF, 277 KB
english, 1996