Chemical sputtering yields of carbon based materials at...

Chemical sputtering yields of carbon based materials at high ion flux densities

H. Grote, W. Bohmeyer, P. Kornejew, H.-D. Reiner, G. Fussmann, R. Schlögl, G. Weinberg, C.H. Wu
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Volume:
266-269
Year:
1999
Language:
english
Pages:
6
DOI:
10.1016/s0022-3115(98)00854-x
File:
PDF, 1.76 MB
english, 1999
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