Nanoscale Buckling of Ultrathin Low- k Dielectric Lines during Hard-Mask Patterning
Stan, Gheorghe, Ciobanu, Cristian V., Levin, Igor, Yoo, Hui J., Myers, Alan, Singh, Kanwal, Jezewski, Christopher, Miner, Barbara, King, Sean W.Volume:
15
Language:
english
Journal:
Nano Letters
DOI:
10.1021/acs.nanolett.5b00685
Date:
June, 2015
File:
PDF, 3.61 MB
english, 2015