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Chemistry of organosilicon compounds : CXXIX. Evidence for formation of free silyl radicals in the photolysis of aryldisilanes
Hideki Sakurai, Yasuhiro Nakadaira, Mitsuo Kira, Hisashi Sugiyama, Kazuhiro Yoshida, Toshiumi TakiguchiVolume:
184
Year:
1980
Language:
english
Pages:
1
DOI:
10.1016/s0022-328x(00)83499-3
File:
PDF, 261 KB
english, 1980