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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Water immersion optical lithography for 45-nm node
Smith, Bruce W., Kang, Hoyoung, Bourov, Anatoly, Cropanese, Frank, Fan, Yongfa, Yen, AnthonyVolume:
5040
Year:
2003
Language:
english
DOI:
10.1117/12.485489
File:
PDF, 587 KB
english, 2003