High-Precision Analysis of Oxygen Depth Profile in [sup 16]O[sup +]-Implanted Silicon Substrates by Spectroscopic Ellipsometry
Iikawa, Hirofumi, Nakao, Motoi, Gruska, Bernd, Izumi, KatsutoshiVolume:
151
Year:
2004
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1698131
File:
PDF, 672 KB
english, 2004