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Effects of Annealing on Oxygen Depth Profiles and Chemical Etching Rates of Thermally Grown Silicon Oxides
Watanabe, YoshioVolume:
145
Year:
1998
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1838456
File:
PDF, 372 KB
english, 1998