Epitaxial Growth of CoSi[sub 2] on Si Using a CoN[sub x]...

Electrochemical and Solid-State Letters 2005 Vol. 8; Iss. 11

Epitaxial Growth of CoSi[sub 2] on Si Using a CoN[sub x] Interlayer Deposited by Reactive Metallorganic Chemical Vapor Deposition

Kim, Sun Il, Lee, Seung Ryul, Park, Jong Ho, Ahn, Byung Tae
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Volume:
8
Year:
2005
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.2073675
File:
PDF, 501 KB
english, 2005
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