Atomic Layer Deposition of Low-Resistivity and High-Density...

Electrochemical and Solid-State Letters 2006 Vol. 9; Iss. 3

Atomic Layer Deposition of Low-Resistivity and High-Density Tungsten Nitride Thin Films Using B[sub 2]H[sub 6], WF[sub 6], and NH[sub 3]

Kim, Soo-Hyun, Kim, Jun-Ki, Kwak, Nohjung, Sohn, Hyunchul, Kim, Jinwoong, Jung, Sung-Hoon, Hong, Mi-Ran, Lee, Sang Hyeob, Collins, Josh
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Volume:
9
Year:
2006
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.2161451
File:
PDF, 239 KB
english, 2006
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