[ECS 210th ECS Meeting - Cancun, Mexico (October 29-November 3, 2006)] ECS Transactions - Ni, Pt and Yb Based Fully Silicided (FUSI) Gates for Scaled CMOS Technologies
Kittl, Jorge A., Lauwers, Anne, van Dal, Mark, Yu, Hongyu, Veloso, Anabela, Hoffmann, Tom, Pawlak, Malgorzata, Demeurisse, Caroline, Kubicek, Stefan, Niwa, Masaaki, Vrancken, Christa, Absil, Philip, BVolume:
3
Year:
2006
Language:
english
DOI:
10.1149/1.2356283
File:
PDF, 612 KB
english, 2006