Effect of Al Incorporation in the Thermal Stability of...

Effect of Al Incorporation in the Thermal Stability of Atomic-Layer-Deposited HfO[sub 2] for Gate Dielectric Applications

Chiou, Yan-Kai, Chang, Che-Hao, Wang, Chen-Chan, Lee, Kun-Yu, Wu, Tai-Bor, Kwo, Raynien, Hong, Minghwei
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Volume:
154
Year:
2007
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2472562
File:
PDF, 354 KB
english, 2007
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