Cyclic Plasma Treatment during ALD Hf1-xZrxO2 Deposition
Bhuyian, M. N., Misra, D., Tapily, K., Clark, R. D., Consiglio, S., Wajda, C. S., Nakamura, G., Leusink, G. J.Volume:
3
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.020405jss
Date:
March, 2014
File:
PDF, 952 KB
english, 2014