Characterization of Defects and Stress in Polycrystalline...

Characterization of Defects and Stress in Polycrystalline Silicon Thin Films on Glass Substrates by Raman Microscopy

Kitahara, Kuninori, Ishii, Toshitomo, Suzuki, Junki, Bessyo, Takuro, Watanabe, Naoki
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Volume:
2011
Year:
2011
Language:
english
Journal:
International Journal of Spectroscopy
DOI:
10.1155/2011/632139
File:
PDF, 5.85 MB
english, 2011
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