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Effect of O2/Ni ratio on structure and surface morphology of atmospheric pressure MOCVD grown NiO thin films
Roffi, Teuku M., Nakamura, Motohiko, Uchida, Kazuo, Nozaki, ShinjiVolume:
1577
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/opl.2013.651
Date:
January, 2013
File:
PDF, 641 KB
english, 2013