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Fabrication of Crystallized Si Film Deposited on a Polycrystalline YSZ Film/Glass Substrate at 500°C
Horita, Susumu, Kanazawa, Keisuke, Nishioka, Kensuke, Higashimine, Koichi, Koyano, MikioVolume:
910
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-0910-a21-17
Date:
January, 2006
File:
PDF, 715 KB
english, 2006